Prof. Dr. Harry J. Whitlow

Phone: 337-482-6696
Email: hxw1673@louisiana.edu
Louisiana Accelerator Center
P.O. Box 43600
University of Louisiana at Lafayette
Lafayette, LA 70504, USA

Education:

BSc (hons): University Bath, UK, 1976
DPhil: University of Sussex, UK, 1981
Docent: The Royal Institute of Technology, Sweden, 1987
DSc: University Bath, UK, 1998
Professor: University of Lund, Sweden, 2000
Professor: University of Jyväskylä, Sweden, 2004

Refereed Publications (188):

  1. A. Paone, R. Sanjines, P. Jeanneret, H. J. Whitlow, E. Guibert, G. Guibert,1, F. Bussy, J.-L. Scartezzini, A. Schüler. Influence of doping in thermochromic V1-xWxO2 and V1-xAlxO2 thin films: twice improved doping efficiency in V1-xWxO2. J. Alloys and Compounds 621(2015)206-211. doi:10.1016/j.jallcom.2014.08.264

  2. S.T. Nakagawa, T. Murakami, M. Nomura, H. Kanda, E. Sukedai, HJ. Whitlow; How can we monitor the recovery of a damage crystal by the post anneal?, IEEJ Transactions on Electronics, Information and Systems Vol. 134 (2014) No. 4 P 479-483 http://doi.org/10.1541/ieejeiss.134.479

  3. R. Norarat, E. Guibert, P. Jeanneret, J. Jenni, A. Roux, L. Stoppini, H. J. Whitlow, A compact gas ionisation direct-STIM detector for MeV ion microscopy Nuclear Instr. Methods B 348(2015)58-61. http://dx.doi.org/10.1016/j.nimb.2014.12.074

  4. R. Norarat and H.J. Whitlow, Resolution intercomparison in microscopy and lithography using light and ion beam imaging, Nuclear Instr. Methods B. B 348(2015)53-57. http://dx.doi.org/10.1016/j.nimb.2015.01.030

  5. A. Homsey, E. Laux, J. Brossard, H.J. Whitlow, M. Roccio, S. Hahnewald, P. Senn, P. Mistrik, R. Hessler, T. Melchionnia, C. Frick, H.Löwenheim, M. Müller, U. Wank, K.-H. Wiesmüller, H. Keppner, Fine control of drug delivery for cochlear implant applications. Hearing, Balance and Communication, Early Online: 1-7, doi:10.3109/21695717.2015.1048082

  6. H. J. Whitlow, R. Norarat, M. Roccio, P. Jeanneret, E. Guibert, M. Bergamin, G. Fiorucci, A. Homsy, E. Laux, H. Keppner, P. Senn., MeV ion beam lithography of bicompatable halogenated Parylenes using aperture masks. Nuclear Instr. Methods B 354(2015) 34-36, doi:10.1016/j.nimb.2014.10.024.